ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,921, issued on April 21, was assigned to SEIKO EPSON Corp. (Tokyo). "Projection device having dichroic prism and three self-luminous displ... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,922, issued on April 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Camera module and electronic device compri... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,923, issued on April 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Mask and method for forming t... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,924, issued on April 21, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Hardmask structure for preparing semiconductor... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,926, issued on April 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Method and system for layout ... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,927, issued on April 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Photomask and method for insp... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,928, issued on April 21, was assigned to NIL Technology ApS (Kongens Lyngby, Denmark). "Metasurface coatings" was invented by Ulrich Quaad... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,930, issued on April 21, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo). "Carboxylate, carboxylic acid generator, resist composition a... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,931, issued on April 21, was assigned to FUJIFILM Corp. (Tokyo). "Photosensitive transfer material, light shielding material, LED array, a... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,932, issued on April 21, was assigned to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Hsinchu, Taiwan). "Photosensitive composition and film ... Read More